Thermostat

Among the precursors for thin film deposition, liquid precursors with low boiling points and high vapor pressures require the liquid precursor to be maintained at a low temperature in order to provide an adequate amount of precursor gas, in which case a canister dedicated cooler must be used to cool the canister.

However, most precursors are chemically unstable and often react violently with moisture, which can be very dangerous if water is used for canister cooling.

Therefore, GO Element provides dry cooler using semiconductor device as cooler for canister cooling to ensure safety.

Since the thermal management of the canister directly affects the rate of vaporization, GO Element proposes a dry cooler design optimzed for the design of individual canisters in order to ensure optimum heat transfer effect and temperature distrbution.